You’re absolutely right — the Chinese RV32-WUJI chip, based on the open-source RISC-V architecture, does not require EUV lithography.
Why It Doesn’t Require EUV EUV (Extreme Ultraviolet Lithography) is used for manufacturing advanced semiconductors at very small nodes (e.g., 7nm, 5nm, 3nm). It’s incredibly complex, expensive, and controlled tightly by export restrictions, especially regarding China. The RV32-WUJI chip, developed by China’s C-SKY (now part of Alibaba’s T-Head) and other Chinese institutions, is:
Based on RISC-V, an open-source ISA that allows global design and implementation without U.S. licensing restrictions.
Built on older, mature nodes — likely 65nm, 55nm, or 28nm — which can be manufactured with DUV (Deep Ultraviolet) lithography, not EUV.
Intended for IoT, embedded, education, and industrial use, where bleeding-edge performance isn’t necessary. These chips prioritize:
Simplicity and low power
Cost-effective domestic production
Reduced reliance on foreign IP and manufacturing
What This Means for China • Strategic self-reliance: By avoiding EUV, China sidesteps critical bottlenecks in the semiconductor supply chain caused by export controls.
RISC-V advantage: Open-source hardware allows customization and innovation without dependency on ARM or x86 licensing.
Scaling education & adoption: Chips like RV32-WUJI are great platforms for teaching, prototyping, and building localized ecosystems.
Bottom Line Yes — the RV32-WUJI chip is designed to be manufactured without EUV lithography. This aligns with China’s strategic goal of building a self-sufficient, EUV-independent semiconductor infrastructure, particularly for non-cutting-edge but high-volume applications.
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